HIPS and SIPS 10 introduces exciting new capabilities for automation, efficiency, and usability through the integration of the Process Designer and the simultaneous introduction of the first commercially available solution for generating Variable Resolution (VR) Surfaces from source data.
Inspired by CARIS Onboard, the Batch Processor has been replaced with the new Process Designer. It provides access to the most important HIPS and SIPS processes including bathymetry and imagery workflows, base surfaces, mosaic, and VR Surface creation. The drag and drop concept, which is the basis of the Process Designer, acts as a graphical interface for users. This creates the ability to build pre-defined and parallel workflows for the first time.
CARIS’ Variable Resolution (VR) technology allows the creation of a single surface product from widely disparate data, eliminating this processing bottleneck and greatly simplifying user workflows and file management. A VR surface can be contoured in a single pass. This saves a great deal of time as traditionally, multiple surfaces would need to be generated and contoured. These contours would then require stitching together into single continuous line features and related depth areas.
Following on CARIS’ efforts towards a common architecture for all products, many new features seen in the release of CARIS BASE Editor 4.2 are now available for all HIPS and SIPS users. This includes harmonized 2D and 3D display options, high-resolution image draping in 3D, enhanced Coordinate Reference System support, and more.